BEGIN:VCALENDAR
VERSION:2.0
PRODID:-//CVD Equipment Corporation - ECPv6.17.1//NONSGML v1.0//EN
CALSCALE:GREGORIAN
METHOD:PUBLISH
X-WR-CALNAME:CVD Equipment Corporation
X-ORIGINAL-URL:https://cvdequipment.com
X-WR-CALDESC:Events for CVD Equipment Corporation
REFRESH-INTERVAL;VALUE=DURATION:PT1H
X-Robots-Tag:noindex
X-PUBLISHED-TTL:PT1H
BEGIN:VTIMEZONE
TZID:America/New_York
BEGIN:DAYLIGHT
TZOFFSETFROM:-0500
TZOFFSETTO:-0400
TZNAME:EDT
DTSTART:20140309T070000
END:DAYLIGHT
BEGIN:STANDARD
TZOFFSETFROM:-0400
TZOFFSETTO:-0500
TZNAME:EST
DTSTART:20141102T060000
END:STANDARD
BEGIN:DAYLIGHT
TZOFFSETFROM:-0500
TZOFFSETTO:-0400
TZNAME:EDT
DTSTART:20150308T070000
END:DAYLIGHT
BEGIN:STANDARD
TZOFFSETFROM:-0400
TZOFFSETTO:-0500
TZNAME:EST
DTSTART:20151101T060000
END:STANDARD
BEGIN:DAYLIGHT
TZOFFSETFROM:-0500
TZOFFSETTO:-0400
TZNAME:EDT
DTSTART:20160313T070000
END:DAYLIGHT
BEGIN:STANDARD
TZOFFSETFROM:-0400
TZOFFSETTO:-0500
TZNAME:EST
DTSTART:20161106T060000
END:STANDARD
END:VTIMEZONE
BEGIN:VEVENT
DTSTART;VALUE=DATE:20150406
DTEND;VALUE=DATE:20150412
DTSTAMP:20160323T130158Z
CREATED:20150201T140032Z
LAST-MODIFIED:20160323T130158Z
UID:1207-1428307200-1428739199@cvdequipment.com
SUMMARY:MRS Spring 2015
DESCRIPTION:CVD Equipment Corporation\, Booth #524\, cordially invites you to attend the exhibit held in conjunction with the 2015 MRS Spring Meeting in San Francisco. Over 140 international exhibitors from all sectors of the global materials science and engineering communities will display a full spectrum of equipment\, products\, instrumentation\, software\, publications and services. \nExhibit Hours:\nTuesday\, April 7th at 10 am-5:30 pm and Wednesday\, April 8th at 10 am-6 pm\nVisit CVD Booth  #524 and we will show you a range of high quality CVD 300 mm graphene samples fabricated with our new patent pending EasyGraphene™ manufacturing technology. We will be available to also discuss both your CVD graphene and nanomaterial manufacturing scale up needs enabled by our novel patent pending batch processing solutions. \nOral Presentation:\n“Large-Scale Production of AB-Stacked Bilayer Graphene Using Ethanol as Precursor”\nThursday\, April 9th\, 2015 at 9:15am on Level 2\, Room 2010/2012\nWe will start the presentation with a description of the technique demonstrated by Pei Zhao and collaborators\, see publication ACS Nano\, 2014\, 8 (11)\, 11631\, to produce self-limited bilayer CVD graphene. We will then report on our use of this technique\, combined with our patent pending graphene scale up technology\, to produce large area bilayer CVD graphene on copper. Enhancements to our CVDWinPrC™system control software will be discussed\, that can provide automated diagnostic feedback for liquid precursors in a bubbler configuration. The online process parameter calculations aid in the process development and stabilization of bilayer graphene and other nanomaterial synthesis.
URL:https://cvdequipment.com/event/mrs-spring-2015/
LOCATION:Moscone West\, 800 Howard St\, San Francisco\, CA\, 94103\, United States
CATEGORIES:Tradeshows
ATTACH;FMTTYPE=image/png:https://cvdequipment.com/wp-content/uploads/2015/02/MRS-Spring2015-PostImage1.png
END:VEVENT
END:VCALENDAR