RONKONKOMA, N.Y., (Business Wire) – February 19th, 2009 – CVD Equipment Corporation (NASDAQ: CVV) announces the introduction of a family of opens in a new windowEasyTube™ systems with a focus on quality control and research & development for next generation process development in the solar and energy fields aimed at reducing the global dependence on oil and gas. The EasyTube™ platform provides a framework of solutions that can be quickly and cost efficiently customized to a wide variety of thin film process requirements needed to accelerate the commercialization of next generation solar cell/modules and smart windows.
For example, our EasyTube™ 3000-SiQC systems have been sold to qualify Silicon precursor materials for the solar and semiconductor industry (EasyTube™ 3000 SiQC). These systems are used for quality control of the Chlorosilane precursors used to manufacture polycrystalline silicon rods. By using the same precursor to deposit an epitaxial film that is measured for purity, the purity of the Silicon precursor material can be determined. This quality control tool will help develop lower cost manufacturing methods for Polysilicon precursors being proposed to manufacture solar cells with only slightly reduced photovoltaic conversion efficiency.
In addition, the EasyTube™ research systems are capable of other film depositions, for example amorphous silicon, polysilicon, silicon nitride, High or low temperature silicon dioxide, silicon and silicon-germanium epitaxial, Transparent Conductive Oxides (SnO2, ZnO, etc.), opens in a new windowSulfurization, Selenization, opens in a new windowRapid Thermal Annealing, POCl3 and other related diffusion driven processes needed for next generation Silicon and CIGS solar cell process optimization. The EasyTube™ system can be equipped with a wide variety of options, including a load-lock, operation at high or low pressures, substrate rotation for deposition and composition uniformity, rapid heating and many others. The EasyTube™ process gas handling system accommodates pyrophoric, flammable, corrosive, toxic, solid and liquid source materials. Optional gas, liquid or solid source delivery and process gas exhaust treatment enable turn-key process solutions that save both time and money.
The highly successful EasyTube™ product line has been sold worldwide to universities and research laboratories for applications in the nanotechnology and semiconductor research markets. The expanded EasyTube™ product line focuses on applications in the solar and energy industry to provide lower cost research and faster delivery to develop solar and energy related manufacturing processes.
About CVD Equipment Corporation
CVD Equipment Corporation owns and operates three divisions: Together the CVD and opens in a new windowFirstNano® product group form the CVD/FirstNano® division. The CVD product group designs and builds pilot and production equipment for custom Chemical Vapor Deposition processes for a very wide variety of applications. The First Nano product group manufactures the EasyTube™ equipment product line used by researchers around the world to develop and grow a wide variety of next generation nanowire, nanotube and thin film materials. The CVD/FirstNano® division also operates an application laboratory where it develops advanced processes and solutions to facilitate the commercialization of emerging technology in the nano/solar and green field and develops/optimizes custom material manufacturing processes. The Stainless Design Concepts Division manufactures Ultra High Purity (UHP) gas and chemical delivery systems for state-of-the-art semiconductor fabrication processes. It offers complete gas and chemical delivery product lines ranging from cutting-edge to basic gas and chemical handling. The Conceptronic/Research International division supplies reflow ovens and rework stations to the Printed Circuit Board assembly market and ball attach ovens to the back-end semi-conductor packaging industry. It also develops custom industrial inline oven based systems that process materials with controlled gas atmospheres and temperature profiles.
This press release contains forward-looking statements set within the meaning of the Private Securities Litigation Reform Act of 1995, except for historical information contained herein; the matters set forth in this news release are forward-looking statements. Readers should note that the forward-looking statements set forth above involve a number of risks and uncertainties that could cause actual results to differ materially from any such statement, including, without limitation, the uncertainties discussed under the caption “Risk Factors” in the Company’s Registration Statement on Form S-1 filed with the SEC on July 3, 2007, as subsequently amended, which discussion is incorporated herein by reference. Readers should also read the periodic filings and current Form 8-K reports of the Company.
For further information Contact: CVD Equipment Corporation, Investor Relations, Phone: 631 981-7081, Fax: 631 981-7095 or email: firstname.lastname@example.org new email