UHVCVD Systems

Ultra-High Vacuum CVD (UHVCVD) Systems

CVD Equipment Corporation’s UHVCVD System is an automatically controlled research unit designed for the processing of single or batch wafers with diameters up to 200 mm at temperatures up to 900 °C or above. The system consists of a load lock chamber and deposition tube. The load lock chamber contains the robot that moves the wafer between the load lock and the process tube. The high vacuum load lock minimizes the transfer of the ambient atmosphere into the process tube.

Process Tube Vacuum System – is designed for operation of the process tube at less than 10 mTorr and is capable of pumping a clean process tube to a level of less than 10-9 Torr at room temperature with no gas flows.

Loadlock Vacuum System – is designed for pumping a clean load lock to a level of less than 107 Torr at room temperature with no gas flows.

Heating System – CVD Equipment Corporation’s resistance heating element is specifically designed for applications requiring precision uniform heating in both the radial and axial directions. The low mass three-zone heating element is designed to give a uniform flat zone (±0.5 °C) extremely quick response, and long life.


UHVCVD System Features & Benefits:

Manufacturing Enterprise System (MES) Compatible Integration

CVDWinPrC™ system control software for real-time process control, graphing, data logging, and process recipe editing

Robust, low-maintenance design

The gas system is designed to be in close proximity to the process chamber gas inlet to allow for close coupling between components and the process chamber. This provides for minimal line length, and minimal d dead space, and allows for fast gas switching

We also offer multi-chamber cluster systems with an LPCVD chamber and/or an evaporator chamber attached to the UHVCVD chamber. A high vacuum transfer chamber is provided to allow wafer transfer between process chambers under a partial pressure of H2.

A typical use of this system is for low-temperature deposition of silicon, silicon germanium, and germanium epitaxial films where abrupt changes in composition and dopant levels are required.

powered by CVDWinPrC™

Powered by our CVDWinPrC™ process control software, the systems automatically log data and graphically show time-dependent values of user-selected parameters. CVDWinPrC™ also allows users to load preprogrammed recipes, modify, check, and create new recipes, and view real-time or saved process data.

Safety Protocols

The systems have application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.


High-Touch Customer Service, Including:

  • Site Survey
  • Installation Coordination and Field Acceptance
  • NRTL/UL/CE Certification Available
  • Initial Start-Up Support
  • On-Site Training
  • Warranty Response and Remote Capability
  • Help Desk Support & Customized Service Contract Plans
  • Continuous Improvement Programs and Support
  • Customized Site Support Contracts
  • Spares and Consumables
  • Preventative Maintenance
  • Site Personnel Contracts
High Touch Customer Service
About Us

Over 40 years of expertise in CVD and thermal process equipment design and manufacturing.
enabling tomorrow’s technologies ™ ”