Nanomaterials & Semiconductors
FirstNano® R&D systems for processing graphene, carbon nanotubes, semiconducting nanowires, 2D materials, and thin films for research laboratories. CVD process equipment is used in the fabrication of solar cells and TCO coatings as well as semiconductors and optoelectronics materials.
Common semiconducting materials include silicon, germanium, arsenic, antimony, etc. They can be formed in binary, ternary, and Quaternary compounds with metals such as aluminum, gallium, and indium. They are also generated in the form of oxides, nitrides, carbides, etc. Each semiconducting material or compound has specific properties that can be exploited to realize a particular device. Common semiconducting thin films include silicon carbide (SiC), gallium nitride (GaN), gallium arsenide (GaAs), etc. Complex structures such as multi-layer stacks, nanowires/nanorods, and quantum dots can be produced using CVD processes.
For more information on the Silicon Carbide Semiconductor market click the button below.
CVD Equipment Corporation has over 40 years of experience in designing and manufacturing turn-key CVD systems. Our products meet the stringent demands required in order to maintain controllable and repeatable deposition of high quality, high purity semiconducting crystal structures, and epitaxial layers. We have developed a modular platform that allows user to configure their equipment for their specific requirements. Our technology is tried and tested, with systems in operation worldwide.
UHVCVD System Features & Benefits:
MOCVD System Features & Benefits:
LPECVD System Features & Benefits:
CVD processes are widely used in solar cell manufacturing, from the deposition of crystalline silicon in a c-Si solar cell, to the deposition of a range of different materials in thin film solar cells (TFSCs). Other examples of uses of CVD Equipment Corporation’s CVD processing equipment in the solar industry include deposition of amorphous silicon (a-Si), micro-crystalline silicon (μc-Si), silicon, silicon-germanium, etc. Also, our equipment is used for trichlorosilane (TCS) source quality control, antireflection (AR) coatings such as silicon nitride and high or low temperature silicon dioxide, transparent conductive oxides (SnO2, ZnO, etc.), sulfurization/selenization, rapid thermal annealing, doping (e.g. using phosphoryl chloride, POCl3) and other related dopant diffusion processes needed for next generation silicon and copper-indium-gallium-selenide (CIGS) solar cell modules.
SiQC System Features & Benefits:
APCVD System Features & Benefits:
Over 40 years of expertise in CVD and thermal process equipment design and manufacturing.
“enabling tomorrow’s technologies ™ ”