Plasma Enhanced CVD (PECVD) Systems
PECVD is required for the synthesis of many semiconducting and dielectric films. It is also used for industrial coatings where the benefits of CVD are required: conformity, high density, high purity, uniformity, but where the substrate or deposited layers cannot be subjected to high temperatures.
A plasma of the reacting gases is formed in an electric field, either DC or RF, to allow reactions to occur and layers to deposit at lower temperatures. Our PECVD systems are designed and manufactured for industrial applications.
PECVD SYSTEM FEATURES & OPTIONS
We also offer EasyTube® systems through our FirstNano® brand of R&D products for CNT and graphene growth at lower temperatures using inductively coupled plasma.
powered by CVDWinPrC™
Powered by our CVDWinPrC™ process control software, the systems automatically log data and graphically show time-dependent values of user-selected parameters. CVDWinPrC™ also allows users to load preprogrammed recipes, modify, check, and create new recipes, and view real-time or saved process data.
The systems have application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.
High-Touch Customer Service, Including:
- Site Survey
- Installation Coordination and Field Acceptance
- NRTL/UL/CE Certification Available
- Initial Start-Up Support
- On-Site Training
- Warranty Response and Remote Capability
- Help Desk Support & Customized Service Contract Plans
- Continuous Improvement Programs and Support
- Customized Site Support Contracts
- Spares and Consumables
- Preventative Maintenance
- Site Personnel Contracts
Over 40 years of expertise in CVD and thermal process equipment design and manufacturing.
“enabling tomorrow’s technologies ™ ”