CENTRAL ISLIP, N.Y., (Business Wire) – March 9, 2015 – CVD Equipment Corporation (NASDAQ: CVV), a leading provider of standard and custom chemical vapor deposition systems, today announced that it will be entering into an industrial partnership with Penn State University.
Through the National Science Foundation’s Emerging Frontiers in Research and Innovation (EFRI) program, Penn State University (PSU) has been awarded $1.96M for Two-dimensional Atomic-layer Research and Engineering (2-DARE). This PSU project, headed by Professor Joan Redwing, will leverage CVD Equipment Corporation’s engineering and manufacturing capabilities to advance the deposition technologies and processes for producing novel 2D materials beyond graphene. The main focus will be on developing and optimizing the techniques for producing crystalline 2D transition metal dichalcogenides (TMDs) such as molybdenum disulfide (MoS2) and tungsten diselenide (WSe2). This work will pave the way for the future production of 2D materials, as they find their place in widespread industrial applications.
Over recent years, the demonstration of graphene’s remarkable physical properties has led to the emerging application of graphene in many next generation products and devices. Although there is still much work to be done to fully understand graphene, many researchers have turned their attention to other 2D materials with equally promising and often unique properties. As such, a whole host of 2D materials are under vibrant interdisciplinary scientific study with an exciting outlook for disruptive technological advancements in big businesses such as semiconductor, optoelectronics, structural, and environmental applications, amongst others. Chemical vapor deposition and atomic layer deposition techniques are proving to be powerful for producing these atomically thin materials, but the often home-built university lab deposition equipment is limited in the process capabilities.
About CVD Equipment Corporation
CVD Equipment Corporation (NASDAQ: CVV) is a designer and manufacturer of custom and standard state-of-the-art equipment used in the development, design and manufacture of advanced electronic components, materials and coatings for research and industrial applications. CVD offers a broad range of chemical vapor deposition, gas control, and other equipment that is used by customers to research, design and manufacture semiconductors, solar cells, graphene, carbon nanotubes, nanowires, LEDs, MEMS, smart glass coatings, batteries, ultra capacitors, medical coatings, industrial coatings and equipment for surface mounting of printed circuit components. CVD’s application laboratory focuses on higher efficiency nano and nano to macro material manufacturing for a wide variety of growth markets, which are marketed through our wholly owned subsidiary CVD Materials Corporation.
The Private Securities Litigation Reform Act of 1995 provides a “safe harbor” for forward-looking statements. Certain information included in this press release (as well as information included in oral statements or other written statements made or to be made by CVD Equipment Corporation) contains statements that are forward-looking. All statements other than statements of historical fact are hereby identified as “forward-looking statements, “as such term is defined in Section 27A of the Securities Exchange Act of 1933, as amended, and Section 21E of the Securities Exchange Act of 1934, as amended. Such forward looking information involves a number of known and unknown risks and uncertainties that could cause actual results to differ materially from those discussed or anticipated by management. Potential risks and uncertainties include, among other factors, conditions, success of CVD Equipment Corporation’s growth and sales strategies, the possibility of customer changes in delivery schedules, cancellation of orders, potential delays in product shipments, delays in obtaining inventory parts from suppliers and failure to satisfy customer acceptance requirements.
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