PECVD Systems
High-Performance Plasma Enhanced Chemical Vapor Deposition System for Thin Film Deposition & the Growth of CNFs & CNTs
Industrial Processes for the Semiconductor Industry
DC, Pulsed DC, or RF Plasma
Generating Layers of Nanomaterials Including CNFs & CNTs
Automated Showerhead Gas Delivery
Uniform Process Gas Distribution
Low Temperature Plasma Enhanced Technology
Uniform Growth on 200 mm wafers
Automated Wafer Loading and Unloading
Available with CVD Equipment Corporation’s Front-End Loader
The system is designed for PECVD processes for thin film deposition as well as growth of Carbon Nanofibers (CNFs) and Carbon Nanotubes (CNTs). Using low temperature plasma enhanced technology, reduced pressure, heat, and process gas delivery to the process chamber, the PECVD200™ offers excellent material property control, conformity, and step coverage. This solution provides enhanced temperature stabilization engineered for uniform growth across 200 mm wafers. The PECVD200™ is ideal for depositing semiconducting and dielectric films including thin SiO2 films for power electronics, other gate dielectrics, and nanomaterials, it can also be configured for graphene.
PECVD200™ Features & Benefits:
Available with CVD Equipment Corporation’s Front-End Loader for Automated Wafer Loading and Unloading
Wafer Temperatures Under Plasma Conditions up to 800 °C
Substrate Rotation up to 60 RPM for Increased Deposition Uniformity
Proprietary Multi-Zone Temperature Control System
Radial Center to Edge Temperature Uniformity of ±1% of Setpoint Temperature
Automated Showerhead Gas Delivery for Uniform Process Gas Distribution
Showerhead Temperature Control at up to 70 °C
Powered by our CVDWinPrC™ Process Control Software, for Real Time Process Control, Graphing, Data Logging, and Process Recipe Editing
In-Situ Plasma Chamber Cleaning
Compact Foot Print
Compatible with Industry Standard SEMI/MESC and SECS/GEM Cluster Tools
FEL200™ Features & Benefits:
Wafer Automation with High Throughput and Reliable Wafer Loading and Unloading
Side-Load Cassette Station with View-port
Metal Cassette Option for Hot Wafer Loading and Unloading
Cassette Platform Detection Sensors for Sensing both Opaque and Transparent Wafers, as Thin as 400 μm
Index Elevator with Wafer Mapping, used to Detect the Number of Wafers in the Cassette
Alignment Sensors to Ensure a Process Run Begins After Wafers are Centered and Aligned Properly, Alerting Misalignment
Optical Wafer Detection and Safety End Stops Which Signal the Motion System
Linear Transfer Arm with End Effector
Custom End Effectors are Available with Materials and Geometries to Meet Specific Application Needs
The FEL 200™ is a 25-Wafer Linear Transfer System that can accommodate 100, 150, and 200 mm wafers. The Front End Loader is designed to accept individual wafers or a cassette of wafers for single wafer transfer and processing under vacuum.
The FEL 200™ is compatible with CVD Equipment Corporation’s Process Modules and is MES compatible. Our proprietary Front-End Loader can accept individual wafers or a cassette of wafers and includes a dedicated pumping and purging system that can achieve pressures as low as 5 x 10-5 Torr.
PECVD200™ Brochure
View our PECVD200™ Spec Sheet with Technical Data
We also offer EasyTube® systems through our FirstNano® brand of R&D products for CNT and graphene growth at lower temperatures using inductively coupled plasma.
powered by CVDWinPrC™
Powered by our CVDWinPrC™ process control software, the systems automatically log data and graphically show time-dependent values of user-selected parameters. CVDWinPrC™ also allows users to load preprogrammed recipes, modify, check, and create new recipes, and view real-time or saved process data.
Safety Protocols
The systems have application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.
High-Touch Customer Service, Including:
- Site Survey
- Installation Coordination and Field Acceptance
- NRTL/UL/CE Certification Available
- Initial Start-Up Support
- On-Site Training
- Warranty Response and Remote Capability
- Help Desk Support & Customized Service Contract Plans
- Continuous Improvement Programs and Support
- Customized Site Support Contracts
- Spares and Consumables
- Preventative Maintenance
- Site Personnel Contracts
About Us
Over 40 years of expertise in CVD and thermal process equipment design and manufacturing.
“enabling tomorrow’s technologies ™ ”