SiBondCoat 200™

Vertical, Quartz Process Chamber

Work Zone up to 8″ ID & 8″ H

Substrate Rotation

Improved Deposition Uniformity

Multi Chamber Option

Up to Three Chamber Processing

RF Induction Heating

Process Temperature up to 1500° C

Multiple Gas Injectors

with Independent Flow Control

Low Pressure System for High Thickness Uniformity on 3D Parts

Operating pressure 1 to 500 Torr

CVD Equipment’s SiBondCoat 200™ is a low-pressure chemical vapor deposition (CVD) system designed for industrial production applications for the deposition of silicon coatings as a bond coat on silicon carbide composite materials. This process is used to improve adhesion of subsequent coatings and is often used prior to the deposition of Environmental Barrier Coating (EBC) layers.

The SiBondCoat 200™ enables uniform deposition, achieving high purity and maintaining uniformity over the surface of three dimensional components and parts having complex shapes and geometries, providing a conformal interfacial coating/layer to enhance the adhesion of EBCs.

The system controllably doses a halide precursor into the high temperature reactor where the chemical reactions occur to deposit the uniform Si coating. Several options are available for chemical vapor delivery including reactive gas or vapor delivery, direct liquid injection, and bubbler source injection. Separate, independently controlled gas injectors are implemented to control dosing in the lower, middle, and upper zone of the reaction chamber for greater control of process uniformity. The SiBondCoat 200™ can be automatic or manually sequenced for optimum control over deposition. RF induction heating of the process retort leads to rapid heating for improved cycles times and throughput. Multi-chamber configurations are available to further enhance throughput.

SiBondCoat 200™ Features & Benefits:

For applying a silicon (Si) layer onto 3D surfaces

Single chamber processing (Multi chamber option)

Multiple gas injectors with independent flow control for thickness uniformity

Capable of direct liquid injection, bubbler source injection, and vapor/gas delivery

Vertical process tube

Substrate loading/unloading facilitated by motor driven access

Temperature control of ±1 °C

Substrate rotation up to 10 RPM

Hazardous gas leak detection & alert systems

Optional gas delivery cabinets

Optional liquid abatement system

Designed for ease of maintenance

Safe handling of pyrophoric by-products in exhaust system

powered by CVDWinPrC™

Powered by our CVDWinPrC™ process control software, the systems automatically log data and graphically show time-dependent values of user-selected parameters. CVDWinPrC™ also allows users to load preprogrammed recipes, modify, check, and create new recipes, and view real-time or saved process data.

Safety Protocols

The systems have application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.

High-Touch Customer Service, Including:

• Site Survey
• Installation Coordination and Field Acceptance
• NRTL/UL/CE Certification Available
• Initial Start-Up Support
• On-Site Training
• Warranty Response and Remote Capability
• Help Desk Support & Customized Service Contract Plans
• Continuous Improvement Programs and Support
• Customized Site Support Contracts
• Spares and Consumables
• Preventative Maintenance
• Site Personnel Contracts