APCVD Systems
Atmospheric Pressure CVD (APCVD) Systems
APCVD is a thin film deposition process with typically high deposition rates. CVD Equipment Corporation offers solutions to scale up your APCVD processes from research to production volumes.
![APCVD System](https://www.cvdequipment.com/wp-content/uploads/2015/06/APCVD-System.png)
Our APCVD systems are used to deposit a layer of material typically several micrometers thick onto wafers or other types of substrates. They are used to grow epitaxial films of Si, compound semiconductors, SiO2, anti-reflection (AR) coatings, and transparent conductive oxide (TCO) coatings. APCVD is also used as a surface-finishing process for items such as tools and turbine blades to improve lifetime and performance.
powered by CVDWinPrC™
Powered by our CVDWinPrC™ process control software, the systems automatically log data and graphically show time-dependent values of user-selected parameters. CVDWinPrC™ also allows users to load preprogrammed recipes, modify, check, and create new recipes, and view real-time or saved process data.
Safety Protocols
The systems have application-configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.
![CVDWinPrC™](https://www.cvdequipment.com/wp-content/uploads/2015/04/CVDWinPrC-computer-monitor-UPDATE.png)
High-Touch Customer Service, Including:
- Site Survey
- Installation Coordination and Field Acceptance
- NRTL/UL/CE Certification Available
- Initial Start-Up Support
- On-Site Training
- Warranty Response and Remote Capability
- Help Desk Support & Customized Service Contract Plans
- Continuous Improvement Programs and Support
- Customized Site Support Contracts
- Spares and Consumables
- Preventative Maintenance
- Site Personnel Contracts
![High Touch Customer Service](https://www.cvdequipment.com/wp-content/uploads/2023/05/Field-Service-Technician-square.jpg)
About Us
Over 40 years of expertise in CVD and thermal process equipment design and manufacturing.
“enabling tomorrow’s technologies ™ ”