LPE Reactor System
Liquid Phase Epitaxy (LPE) Systems
Our LPE systems provide the user with a process-controlled furnace for automated user-specified segment-driven process recipes that achieve optimum control over wafer processing and repetitive results from run to run. The overall systems are designed to reliably grow epitaxial layers of semiconductor materials including mercury cadmium telluride (MCT, HgCdTe) and Gallium Arsenide (GaAs). The LPE systems are capable of processing a wafer over a uniform flat temperature zone.
Multi-zone Rolling Furnace
Temperatures up to 700 °C
Load Lock
Evacuated to 10-6 Torr and pressurized to 200 PSIG
Glove Box
Unloading Sample Under Inert Ambient Conditions
CVDWinPrC™ Software
Real-time process control, data logging, and recipe editing
An automatic, cantilevered, non-contact wafer loading system is incorporated for the loading and unloading of the graphite process boat. The loading system consists of a quartz boat holder that is cantilevered from the automatic end cap assembly. The end cap assembly locates the process boat within the quartz condensation sleeve inside the quartz process tube. The translation speed of the loading system is adjustable from 50-300 mm/min. Door interlocks are provided to prevent the startup of a process run in the event of an incomplete door closure.
CVD Equipment Corporation also offers a vertical dipping system for LPE growth of thicker films at higher rates. It operates at pressures up to 200 PSIG and temperatures up to 700°C. The system has a transfer chamber that can be evacuated to <10-5 Torr and pressurized to 200 PSIG.
LPECVD SYSTEM FEATURES & OPTIONS
Multi-zone rolling resistance furnace for temperatures up to 700°C
+/- 0.25°C temperature uniformity over the flat zone
Rapid controlled heat-up and cool-down of LPE boat
Automatic boat slider
Comprehensive software and hardware safety interlocks
Nitrogen Purged Glovebox with antechamber for moving parts in and out
Integrated vacuum system to 10-6 Torr
User settable warnings and alarms
CVDWinPrC™ system control software for real-time process control, graphing, data logging, and process recipe editing
powered by CVDWinPrC™
Powered by our CVDWinPrC™ process control software, the systems automatically log data and graphically show time-dependent values of user-selected parameters. CVDWinPrC™ also allows users to load preprogrammed recipes, modify, check, and create new recipes, and view real-time or saved process data.
Safety Protocols
The systems have application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.
High-Touch Customer Service, Including:
- Site Survey
- Installation Coordination and Field Acceptance
- NRTL/UL/CE Certification Available
- Initial Start-Up Support
- On-Site Training
- Warranty Response and Remote Capability
- Help Desk Support & Customized Service Contract Plans
- Continuous Improvement Programs and Support
- Customized Site Support Contracts
- Spares and Consumables
- Preventative Maintenance
- Site Personnel Contracts
About Us
Over 40 years of expertise in CVD and thermal process equipment design and manufacturing.
“enabling tomorrow’s technologies ™ ”