MOCVD Systems
Metal Organic CVD (MOCVD) Systems
MOCVD is a process used for creating high-purity crystalline compound semiconducting thin films and micro/nanostructures. Precision fine-tuning, abrupt interfaces, epitaxial deposition, and a high level of dopant control can be readily achieved. It is widely adopted in R&D and industry for advanced optoelectronics, high-power, and high-speed electronics applications.
Devices that benefit from this technology include lasers and LEDs, solar cells, and field effect transistors (FETs). MOCVD technology allows for high volume production of bandgap engineered semiconducting heterostructures. MOCVD can also be used for the controlled production of 0D, 1D and 2D nanomaterials.
Wafer Rotation
Batch processing of single wafers or multiple wafers is available
Horizontal Induction (RF) Heating
Process Temperatures > 1500 °C
Load Lock Chamber
Prevents process chamber contamination from the air when loading/unloading substrates
CVDWinPrC™ Software
Real-time process control, data logging, and recipe editing
CVD Equipment’s Metal Organic Chemical Vapor Deposition System is automatically controlled via process recipes. The system consists of a Loadlock Chamber and UHV Process Tube. The Loadlock Chamber contains the transfer arm that moves the wafer between the loadlock and the Process Chamber. The high vacuum loadlock minimizes the transfer of ambient atmosphere into the process chamber. The system is designed for either ballroom or through-the-wall operation to minimize the footprint within your cleanroom. CVD will work with you to optimize the layout of the system within your facility. The overall system is designed for ease of maintenance
Our MOCVD systems have the capability of depositing layers of desired composition on a suitable substrate with graded composition (achieved by programming the software to ramp and switch in the appropriate flows). Exact process control produces MOCVD layers with abrupt interfaces or individual layers having a graded composition.
MOCVD SYSTEM FEATURES & OPTIONS
Horizontal or Vertical process chamber
Wafer size is configurable to meet the requirements of end-user
Resistance, IR, or RF heated depending on the temperature requirements
Temperature controlled showerhead
Wafer rotation
Molybdenum or SiC-coated graphite susceptor
Adjustable distance between wafer and showerhead
Low-pressure operation from 100 mTorr to 700 Torr
Automatic substrate loading/unloading
UHP gas lines
CVDWinPrC™ system control software for real-time process control, graphing, data logging, and process recipe editing
Bubbler circuits for use with solid or liquid bubblers, including pressure, temperature, and bubbling gas flow control
Comprehensive software and hardware safety system
Loadlock to protect the process chamber from the ambient atmosphere
Hydrogen purifier
Inert gas purged glove box
Residual gas analyzer
CiphercoN™ hazardous gas cabinets
MicroLine™ or SimplicitY UHP gas panels for argon, nitrogen, helium, oxygen
Exhaust gas conditioning system
Our MOCVD systems are designed to meet your production requirements with flexibility and low operating cost. The systems allow for the deposition of II-VI and III-V materials. Batch processing of single wafers or multiple wafers is available. The systems are designed to process wafer sizes as specified by the end user. A temperature-controlled showerhead delivering exact quantities of precursors and gases, coupled with substrate rotation during deposition, provides excellent deposition uniformity.
Operated through our CVDWinPrC™ process control software, the system automatically logs data and graphically displays the time-dependent values of user-selected parameters. CVDWinPrC™ allows users to load preprogrammed recipes, modify, check/create new recipes and view real-time or saved execution data.
Designed to meet today’s stringent safety standards, the system can safely handle pyrophoric and toxic chemicals. The load lock chamber option prevents process chamber contamination from the air when loading/unloading substrates. The system has application configurable safety protocols embedded into the CVDWinPrC™ software.
powered by CVDWinPrC™
Powered by our CVDWinPrC™ process control software, the systems automatically log data and graphically show time-dependent values of user-selected parameters. CVDWinPrC™ also allows users to load preprogrammed recipes, modify, check, and create new recipes, and view real-time or saved process data.
Safety Protocols
The systems have application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.
High-Touch Customer Service, Including:
- Site Survey
- Installation Coordination and Field Acceptance
- NRTL/UL/CE Certification Available
- Initial Start-Up Support
- On-Site Training
- Warranty Response and Remote Capability
- Help Desk Support & Customized Service Contract Plans
- Continuous Improvement Programs and Support
- Customized Site Support Contracts
- Spares and Consumables
- Preventative Maintenance
- Site Personnel Contracts
About Us
Over 40 years of expertise in CVD and thermal process equipment design and manufacturing.
“enabling tomorrow’s technologies ™ ”